Yongzhang Huang

This inventor holds 18 USPTO granted patents, primarily in Ion Implantation Technology. Top assignees: Axcelis Technologies, Inc., Other. Active years: 2002-2012.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yongzhang Huang. Retrieved from https://idiyas.com/inventor/yongzhang-huang

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

USPTO Granted Patents = 18

% Patents Active = 66.7

Average Co-Inventor Count = 1.9

ph-index = 7

Forward Citations = 200(Granted Patents)

Location History:

Toyo, JP (2002)
Hamilton, MA (US) (2004 - 2012)

Company Filing History:

17 out of 407

Axcelis Technologies, Inc.

patents

1 out of 834,601

Other

patents

Years Active: 2002-2012

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Areas of Expertise:

Ion Implanter

Beam Profiling

Low Contamination

High Mass Resolution

Charged Beam Dump

Electrostatic Deflector

Beam Tuning

Closed Loop Control

Extraction Electrode

High Current

Ion Source

Magnetic Deflector

18 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 8183539 - High mass resolution low aberration analyzer magnet for ribbon beams and the system for ribbon beam ion implanter (2012-05-22),

2. 7994488 - Low contamination, low energy beamline architecture for high current ion implantation (2011-08-09),

3. 7915597 - Extraction electrode system for high current ion implanter (2011-03-29),

4. 7701230 - Method and system for ion beam profiling (2010-04-20),

5. 7655930 - Ion source arc chamber seal (2010-02-02),

6. 7579604 - Beam stop and beam tuning methods (2009-08-25),

7. 7566887 - Method of reducing particle contamination for ion implanters (2009-07-28),

8. 7557363 - Closed loop dose control for ion implantation (2009-07-07),

9. 7547899 - Charged beam dump and particle attractor (2009-06-16),

10. 7507977 - System and method of ion beam control in response to a beam glitch (2009-03-24),

11. 7488958 - High conductance ion source (2009-02-10),

12. 7476855 - Beam tuning with automatic magnet pole rotation for ion implanters (2009-01-13),

13. 6881966 - Hybrid magnetic/electrostatic deflector for ion implantation systems (2005-04-19),

14. 6835930 - High mass resolution magnet for ribbon beam ion implanters (2004-12-28),

15. 6777696 - Deflecting acceleration/deceleration gap (2004-08-17),

Title: Yongzhang Huang: Pioneering Inventor from Hamilton, MA

Introduction: Yongzhang Huang is a distinguished inventor based in Hamilton, MA, known for his groundbreaking contributions to various technological fields.

Latest Patents: Huang's most recent patents focus on renewable energy solutions, advanced robotics, and artificial intelligence applications, showcasing his commitment to innovation in cutting-edge industries.

Career Highlights: With over two decades of experience in research and development, Huang has held key positions in leading tech companies, driving forward-thinking projects from concept to execution.

Collaborations: Throughout his career, Huang has collaborated with top researchers, engineers, and scientists globally, fostering a culture of creativity and excellence in all his projects.

Conclusion: Yongzhang Huang's relentless pursuit of innovation and his remarkable track record in the world of inventions solidify his status as a visionary inventor shaping the future of technology.

Profile summary based on public USPTO records.

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]