Boston, MA, United States of America

Bo H Vanderberg

USPTO Granted Patents = 43 


Average Co-Inventor Count = 2.2

ph-index = 7

Forward Citations = 194(Granted Patents)


Location History:

  • Boston, MA (US) (2002 - 2004)
  • Gloucester, MA (US) (2005 - 2021)

Company Filing History:


Years Active: 2002-2021

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Areas of Expertise:
Ion Implantation
Beam Profiling
Magnetic Scanning
Electrostatic Lens
Hybrid Scanning
Microwave Plasma
Beam Angle Control
Ion Source
Energy Contamination
Plasma Electron Flood
Throughput Enhancement
Current Stabilization
43 patents (USPTO):Explore Patents

Title: **Bo H Vanderberg: Innovator in Ion Implantation Technology**

Introduction

Bo H Vanderberg, based in Boston, MA, is a prolific inventor with an impressive portfolio of 43 patents. His expertise lies in the field of ion implantation systems, where he has made significant contributions to the design and efficiency of magnetic systems used in such technologies.

Latest Patents

Among his latest innovations is the patent for a **scanning magnet design with enhanced efficiency**. This invention is critical for controlling the path of an ion beam in an ion implantation system. The design features a yoke that defines a channel through which the ion beam can be effectively managed downstream of a mass resolving magnet. This innovation enhances the maneuverability and precision of ion beams, which is essential for applications in semiconductor manufacturing.

Another notable patent is for **scan and corrector magnet designs for high throughput scanned beam ion implanters**. This invention introduces a method that provides a non-uniform flux of a ribbon ion beam, allowing for more refined processing of workpieces. The system comprises a scanning apparatus that utilizes a time-varying potential to direct the ion beam across a defined scan path, ensuring uniform incidence across the workpiece through its advanced corrector apparatus.

Career Highlights

Bo H Vanderberg currently works at Axcelis Technologies, Inc., where he continues to push the boundaries of ion implantation technology. His work in the industry has established him as a key figure in the development of more efficient ion beam systems that are essential in modern manufacturing processes.

Collaborations

Throughout his career, Vanderberg has collaborated with fellow innovators Edward Eisner and Robert D Rathmell. Together, they have contributed to advancing technology within the field, fostering innovation through teamwork and shared expertise.

Conclusion

With a remarkable track record of 43 patents and ongoing contributions to the field of ion implantation technology, Bo H Vanderberg stands out as a significant inventor in his domain. His latest innovations not only demonstrate his technical prowess but also signify a commitment to improving manufacturing techniques that ultimately benefit the semiconductor industry.

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