The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 18, 2013
Filed:
Feb. 12, 2009
James S. Buff, Brookline, NH (US);
Svetlana Radovanov, Marblehead, MA (US);
Bon-woong Koo, Andover, MA (US);
Wilhelm Platow, Somerville, MA (US);
Frank Sinclair, Quincy, MA (US);
D. Jeffrey Lischer, Acton, MA (US);
Craig R. Chaney, Rockport, MA (US);
Steven Borichevsky, Gloucester, MA (US);
Eric R. Cobb, Danvers, MA (US);
Mayur Jagtap, Burlington, MA (US);
Kenneth H. Purser, Gloucester, MA (US);
Victor Benveniste, Lyle, WA (US);
Shardul S. Patel, North Reading, MA (US);
James S. Buff, Brookline, NH (US);
Svetlana Radovanov, Marblehead, MA (US);
Bon-Woong Koo, Andover, MA (US);
Wilhelm Platow, Somerville, MA (US);
Frank Sinclair, Quincy, MA (US);
D. Jeffrey Lischer, Acton, MA (US);
Craig R. Chaney, Rockport, MA (US);
Steven Borichevsky, Gloucester, MA (US);
Eric R. Cobb, Danvers, MA (US);
Mayur Jagtap, Burlington, MA (US);
Kenneth H. Purser, Gloucester, MA (US);
Victor Benveniste, Lyle, WA (US);
Shardul S. Patel, North Reading, MA (US);
Varian Semiconductor Equipment Associates, Inc., Gloucester, MA (US);
Abstract
Techniques for improving extracted ion beam quality using high-transparency electrodes are disclosed. In one particular exemplary embodiment, the techniques may be realized as an apparatus for ion implantation. The apparatus may comprise an ion source for generating an ion beam, wherein the ion source comprises a faceplate with an aperture for the ion beam to travel therethrough. The apparatus may also comprise a set of extraction electrodes comprising at least a suppression electrode and a high-transparency ground electrode, wherein the set of extraction electrodes may extract the ion beam from the ion source via the faceplate, and wherein the high-transparency ground electrode may be configured to optimize gas conductance between the suppression electrode and the high-transparency ground electrode for improved extracted ion beam quality.