logo

For the Inventor, By the Inventor

Ibaraki, Japan

Toshiyuki Kaeriyama

This inventor holds 17 USPTO granted patents, primarily in Micro-Electromechanical Systems. Top assignees: Texas Instruments Corporation, Hitachi, Ltd., Other. Active years: 1989-2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Toshiyuki Kaeriyama. Retrieved from https://idiyas.com/inventor/toshiyuki-kaeriyama

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 17

% Patents Active = 94.1

Average Co-Inventor Count = 2.0

ph-index = 6

Forward Citations = 191(Granted Patents)


Location History:

  • Miho, JP (1989)
  • Yawara-mura, JP (1999 - 2000)
  • Tsukuba-gun, JP (1998 - 2003)
  • Ibaraki-ken, JP (1998 - 2006)
  • Ibaraki, JP (2010)
  • Tsukubamirai, JP (2013)

Company Filing History:

goldMedal14 out of 29,901 
 
Texas Instruments Corporation
 patents
silverMedal5 out of 42,740 
 
Hitachi, Ltd.
 patents
bronzeMedal2 out of 834,570 
Other
 patents
where one patent can have more than one assignee

Years Active: 1989-2013

Loading Chart...
Areas of Expertise:
Micro-Electromechanical Device
Micromirror Position
Damped Control
Semiconductor Integrated Circuit
Memory Device
Bit Line Stray Capacity
Titanium Nitride
Interconnection System
Wafer Cleaning
Fabrication Process
Screen Stacked Cell
17 patents (USPTO):Explore Patents
1. 8610997 - Micro-electromechanical device (2013-12-17),
2. 7692841 - System and method for regulating micromirror position (2010-04-06),
3. 6987601 - Damped control of a micromechanical device (2006-01-17),
4. 6969649 - Method of manufacturing semiconductor integrated circuit devices having a memory device with a reduced bit line stray capacity and such semiconductor integrated circuit devices (2005-11-29),
5. 6753219 - Method of manufacturing semiconductor integrated circuit devices having a memory device with a reduced bit line stray capacity and such semiconductor integrated circuit devices (2004-06-22),
6. 6618186 - Micro-electromechanical system (2003-09-09),
7. 6528835 - Titanium nitride metal interconnection system and method of forming the same (2003-03-04),
8. 6150214 - Titanium nitride metal interconnection system and method of forming the (2000-11-21),
9. 6077735 - Method of manufacturing semiconductor device (2000-06-20),
10. 6060352 - Method of manufacturing semiconductor device with increased focus margin (2000-05-09),
11. 5937290 - Method of manufacturing semiconductor integrated circuit devices using (1999-08-10),
12. 5933726 - Method of forming a semiconductor device have a screen stacked cell (1999-08-03),
13. 5933724 - Method of manufacturing a semiconductor integrated circuit device using (1999-08-03),
14. 5872046 - Method of cleaning wafer after partial saw (1999-02-16),
15. 5804479 - Method for forming semiconductor integrated circuit device having a (1998-09-08),

Title: Innovations of Toshiyuki Kaeriyama

Introduction

Toshiyuki Kaeriyama is a prominent inventor based in Ibaraki-ken, Japan. He holds a total of 17 patents, showcasing his significant contributions to the field of technology and engineering. His work primarily focuses on micro-electromechanical systems and optical devices.

Latest Patents

One of his latest patents is a micro-electromechanical device that modulates optical path length by adjusting the position of a reflection plane of light. This device features a position-movable plate whose movement is restricted by stopping plates, allowing for precise modulation of the optical path length. The electrostatic attraction created by a voltage differential enables the transition movement of the plate, resulting in high reproducibility and accuracy in light reflection.

Another notable patent is a system and method for regulating micromirror position in a digital micromirror device. This innovation involves adjusting the micromirror's operating temperature and reset sequence by determining a desired tilt angle. The adjustments allow for precise control of the tilt angle, making it suitable for applications requiring fine focus, such as photolithography and holography.

Career Highlights

Throughout his career, Toshiyuki Kaeriyama has worked with renowned companies, including Texas Instruments Corporation and Hitachi, Ltd. His experience in these organizations has contributed to his expertise in developing advanced technologies.

Collaborations

He has collaborated with notable coworkers, including Yoshitaka Tadaki and Toshihiro Sekiguchi. These partnerships have likely enhanced his innovative capabilities and led to the development of groundbreaking technologies.

Conclusion

Toshiyuki Kaeriyama's contributions to the field of micro-electromechanical systems and optical devices are significant. His patents reflect a commitment to innovation and precision in technology. His work continues to influence advancements in various applications, showcasing the importance of his inventions in the modern technological landscape.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…