The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 03, 1999
Filed:
Aug. 26, 1996
Toshihiro Sekiguchi, Hidaka, JP;
Yoshitaka Tadaki, Hanno, JP;
Keizo Kawakita, Ome, JP;
Jun Murata, Kunitachi, JP;
Katsuo Yuhara, Ibaraki-ken, JP;
Toshikazu Kumai, Ome, JP;
Michio Tanaka, Ome, JP;
Michio Nishimura, Tokorozawa, JP;
Kazuhiko Saitoh, Ibaraki-ken, JP;
Takatoshi Kakizaki, Tsukuba, JP;
Takeshi Sakai, Ome, JP;
Toshiyuki Kaeriyama, Ibaraki-ken, JP;
Songsu Cho, Ibaraki-ken, JP;
Hitachi, Ltd., Tokyo, JP;
Texas Instruments, Dallas, TX (US);
Abstract
A phase shifting mask is used for manufacturing a semiconductor integrated circuit device including a conductor pattern in which the line width of patterned conductor strips or the space between patterned conductor strips is not constant. For main transparent areas in the mask corresponding to the conductor pattern, auxiliary pattern segments are provided for compensating changes in the phase distribution of transmitted light caused by changes of the line width or the space. Alternately, the spaces between the conductor strips are adjusted to suppress the changes in the phase distribution of transmitted light. Whether the auxiliary pattern segments should have the phase shifting function is determined depending upon the disposition of the main transparent areas.