Company Filing History:
17 out of 10,326 
2 out of 52,735 
1 out of 101 Years Active: 2006-2020
Title: Innovations of Toshihiro Hayami
Introduction
Toshihiro Hayami is a prominent inventor based in Nirasaki, Japan. He has made significant contributions to the field of plasma processing, holding a total of 18 patents. His work has advanced the technology used in various applications, particularly in semiconductor manufacturing.
Latest Patents
One of Hayami's latest patents is a plasma processing apparatus and method. This innovative method involves executing an etching process that supplies an etching gas into a process container, where a target substrate is supported on a second electrode. The process applies RF power for plasma generation and ion attraction, transforming the etching gas into plasma to etch the target substrate. Additionally, the method includes applying a negative DC voltage to a first electrode during the etching process to enhance the self-bias on the first electrode. Another notable patent is a plasma etching apparatus that features an upper and lower electrode, generating plasma from a process gas to perform plasma etching on a wafer. This apparatus also includes a cooling ring and a correction ring, with a variable DC power supply connected to the correction ring to attract ions in the plasma.
Career Highlights
Throughout his career, Toshihiro Hayami has worked with notable companies such as Tokyo Electron Limited and Kabushiki Kaisha Toshiba. His experience in these organizations has allowed him to develop and refine his innovative ideas in plasma processing technology.
Collaborations
Hayami has collaborated with esteemed colleagues, including Akira Koshiishi and Masaru Sugimoto. Their combined expertise has contributed to the advancement of technologies in their respective fields.
Conclusion
Toshihiro Hayami's contributions to plasma processing technology have made a significant impact in the industry. His innovative patents and collaborations highlight his dedication to advancing the field. His work continues to influence the development of new technologies in semiconductor manufacturing.