The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 17, 2012
Filed:
May. 30, 2006
Masanobu Honda, Nirasaki, JP;
Toshihiro Hayami, Nirasaki, JP;
Masanobu Honda, Nirasaki, JP;
Toshihiro Hayami, Nirasaki, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A plasma processing chamber that enables an amount of attached polymer to be controlled easily with a simple construction. A vesselhouses a semiconductor wafer W. A susceptoris disposed in the vesseland is connected to a lower electrode radio frequency power source. In a plasma processing chamber, RIE and ashing can be carried out on the semiconductor wafer W using plasma produced from processing gases introduced into the vessel. A side wall memberis disposed in the vesseland exposed to the plasma. A potential of the side wall memberis set to either a floating potential or a ground potential in accordance with which of RIE and ashing is carried out.