Company Filing History:

11 out of 1,787

Kla Tencor Corporation

Kla-tencor Technologies Corporation

patents

Years Active: 2008-2023

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14 patents (USPTO):Sort by Forward Citations

Abstract keywords

1. 11796390 - Bandgap measurements of patterned film stacks using spectroscopic metrology (2023-10-24),

2. 11378451 - Bandgap measurements of patterned film stacks using spectroscopic metrology (2022-07-05),

3. 10190868 - Metrology system, method, and computer program product employing automatic transitioning between utilizing a library and utilizing regression for measurement processing (2019-01-29),

4. 10088413 - Spectral matching based calibration (2018-10-02),

5. 9625823 - Calculation method for local film stress measurements using local film thickness values (2017-04-18),

6. 9553033 - Semiconductor device models including re-usable sub-structures (2017-01-24),

7. 9442063 - Measurement of composition for thin films (2016-09-13),

8. 9110020 - Atmospheric molecular contamination control with local purging (2015-08-18),

9. 9046474 - Multi-analyzer angle spectroscopic ellipsometry (2015-06-02),

10. 8830486 - Atmospheric molecular contamination control with local purging (2014-09-09),

11. 8711349 - High throughput thin film characterization and defect detection (2014-04-29),

12. 7903250 - Control by sample reflectivity (2011-03-08),

13. 7453562 - Ellipsometry measurement and analysis (2008-11-18),

14. 7349079 - Methods for measurement or analysis of a nitrogen concentration of a specimen (2008-03-25),

Title: The Innovations of Torsten Rudolf Kaack

Introduction

Torsten Rudolf Kaack is a notable inventor based in Los Altos, California. He holds a total of 14 patents, showcasing his significant contributions to the field of spectroscopic metrology. His work has advanced the understanding and measurement of bandgaps in multilayer grating structures.

Latest Patents

One of his latest patents focuses on bandgap measurements of patterned film stacks using spectroscopic metrology. This innovative system includes a spectroscopic metrology tool and a controller. The controller generates a model of a multilayer grating that includes two or more layers, incorporating geometric parameters indicative of the geometry of a test layer and dispersion parameters indicative of the dispersion of the test layer. The controller receives a spectroscopic signal from a fabricated multilayer grating that corresponds to the modeled multilayer grating. It determines values of the parameters of the modeled multilayer grating, providing a simulated spectroscopic signal that corresponds to the measured spectroscopic signal within a selected tolerance. Furthermore, the controller predicts the bandgap of the test layer based on the determined values of the parameters of the fabricated structure.

Career Highlights

Throughout his career, Torsten has worked with prominent companies such as KLA-Tencor Corporation and KLA Corporation. His experience in these organizations has allowed him to refine his expertise in metrology and contribute to various innovative projects.

Collaborations

Torsten has collaborated with notable professionals in his field, including Leonid Poslavsky and Qiang Zhao. These collaborations have further enriched his work and expanded the impact of his inventions.

Conclusion

Torsten Rudolf Kaack's contributions to the field of spectroscopic metrology and his innovative patents demonstrate his significant role as an inventor. His work continues to influence advancements in technology and measurement techniques.

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