The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 29, 2019

Filed:

Aug. 13, 2015
Applicant:

Kla-tencor Corporation, Milpitas, CA (US);

Inventors:

Liequan Lee, Fremont, CA (US);

Raphael Jean Michel Marie Getin, San Jose, CA (US);

Meng Cao, Union City, CA (US);

Leonid Poslavsky, Belmont, CA (US);

Torsten Rudolf Kaack, Los Altos, CA (US);

Hong Qiu, Union City, CA (US);

Assignee:

KLA-Tencor Corporation, Milpitas, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 11/02 (2006.01); G06N 5/02 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G01B 11/02 (2013.01); G03F 7/70625 (2013.01); G06N 5/02 (2013.01);
Abstract

A metrology system, method, and computer program product that employ automatic transitioning between utilizing a library and utilizing regression for measurement processing are provided. In use, it is determined, by the metrology system, that a predetermined condition has been met. In response to determining that the predetermined condition has been met, the metrology system automatically transitions between utilizing a library and utilizing regression for measurement processing.


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