The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 09, 2014

Filed:

Jun. 28, 2012
Applicants:

Hidong Kwak, San Jose, CA (US);

Ward Dixon, Livermore, CA (US);

Torsten Kaack, Los Altos, CA (US);

Ning-yi Neil Wang, Fremont, CA (US);

Jagjit Sandhu, Fremont, CA (US);

Inventors:

Hidong Kwak, San Jose, CA (US);

Ward Dixon, Livermore, CA (US);

Torsten Kaack, Los Altos, CA (US);

Ning-Yi Neil Wang, Fremont, CA (US);

Jagjit Sandhu, Fremont, CA (US);

Assignee:

KLA-Tencor Corporation, Milpitas, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 11/28 (2006.01); G01N 21/55 (2014.01); G01B 11/06 (2006.01); B08B 5/02 (2006.01); H01L 21/67 (2006.01); H01L 21/66 (2006.01);
U.S. Cl.
CPC ...
B08B 5/02 (2013.01); G01B 11/0641 (2013.01); H01L 22/12 (2013.01); G01B 2210/56 (2013.01); H01L 21/67017 (2013.01);
Abstract

A local purging tool for purging a portion of a surface of a wafer with purging gas is disclosed. The purging tool includes a purging chamber configured to contain purging gas within a cavity of the purging chamber, a permeable portion of a surface of the purging chamber configured to diffuse purging gas from the cavity of the chamber to a portion of a surface of a wafer, and an aperture configured to transmit illumination received from an illumination source to a measurement location of the portion of the surface of the wafer and further configured to transmit illumination reflected from the measurement location to a detector.


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