Fremont, CA, United States of America

Jagjit Sandhu

This inventor holds 2 USPTO granted patents and 1 EPO patent. Top assignee: Kla Tencor Corporation. Active years: 2014-2015.


% Patents Active = 100.0

 

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2014-2015

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2 patents (USPTO):Explore Patents

Title: Jagjit Sandhu: Innovator in Atmospheric Molecular Contamination Control

Introduction

Jagjit Sandhu is a notable inventor based in Fremont, CA. He has made significant contributions to the field of atmospheric molecular contamination control, holding 2 patents to his name. His work focuses on innovative solutions that enhance the efficiency and effectiveness of wafer processing.

Latest Patents

Jagjit Sandhu's latest patents include a groundbreaking tool for atmospheric molecular contamination control. This local purging tool is designed to purge a portion of a wafer's surface using purging gas. The purging tool features a purging chamber that contains purging gas within its cavity. It also includes a permeable portion of the chamber's surface that diffuses the purging gas to the wafer's surface. Additionally, an aperture is incorporated to transmit illumination from a source to a measurement location on the wafer's surface, while also allowing reflected illumination to reach a detector.

Career Highlights

Jagjit Sandhu is currently employed at Kla Tencor Corporation, where he continues to develop innovative technologies. His work has been instrumental in advancing the capabilities of wafer processing and contamination control.

Collaborations

Some of his notable coworkers include Hidong Kwak and Ward RDell Dixon, who contribute to the collaborative environment at Kla Tencor Corporation.

Conclusion

Jagjit Sandhu's contributions to atmospheric molecular contamination control demonstrate his commitment to innovation in the field. His patents reflect a deep understanding of the challenges in wafer processing and offer practical solutions to enhance performance.

Profile summary based on public USPTO records.
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