The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 25, 2008
Filed:
May. 14, 2004
Qiang Zhao, San Jose, CA (US);
Torsten Kaack, Los Altos, CA (US);
Sungchul Yoo, Campbell, CA (US);
Zhengquan Tan, Cupertino, CA (US);
Qiang Zhao, San Jose, CA (US);
Torsten Kaack, Los Altos, CA (US);
Sungchul Yoo, Campbell, CA (US);
Zhengquan Tan, Cupertino, CA (US);
KLA-Tencor Technologies Corp., Milpitas, CA (US);
Abstract
A method for measurement of a specimen is provided. The method includes measuring spectroscopic ellipsometric data of the specimen. The method also includes determining a nitrogen concentration of a nitrided oxide gate dielectric formed on the specimen from the spectroscopic ellipsometric data. A computer-implemented method for analysis of a specimen is also provided. This method includes determining a nitrogen concentration of a nitrided oxide gate dielectric formed on the specimen from spectroscopic ellipsometric data generated by measurement of the specimen. In some embodiments, the methods described above may include determining an index of refraction of the nitrided oxide gate dielectric from the spectroscopic ellipsometric data and determining the nitrogen concentration from the index of refraction. In another embodiment, the methods described above may include measuring reflectometric data of the specimen. The nitrogen concentration may be determined from the spectroscopic ellipsometric data in combination with the reflectometric data.