Location History:
- San Jose, CA (US) (2000 - 2014)
- Fremont, CA (US) (2021)
- Milpitas, CA (US) (2014 - 2024)
Company Filing History:
12 out of 1,787 
5 out of 10,326 
3 out of 530 
Years Active: 2000-2025
Title: Innovations and Contributions of Qiang Zhao in the Field of Plasma Processing
Introduction
Qiang Zhao, based in Milpitas, CA, is a distinguished inventor with a remarkable portfolio of 25 patents. His work primarily focuses on advancements in the realm of plasma processing and metrology systems. Zhao's innovative contributions have significantly influenced the semiconductor manufacturing industry, particularly through his latest patented technologies.
Latest Patents
Among his recent patents, the "Normal-incidence in-situ process monitor sensor" stands out as a pivotal development. This apparatus is designed for in-situ etching monitoring within a plasma processing chamber. It features a continuous wave broadband light source, coupled with an illumination system that directs an incident light beam onto the substrate at normal incidence. The technology allows for precise measurement of various properties of the substrate by employing a collection system that analyzes the reflected light beam, ultimately enabling real-time control of the etching process.
Another notable patent is the "Bandgap measurements of patterned film stacks using spectroscopic metrology." This innovative system employs a spectroscopic metrology tool that works in conjunction with a controller. The controller is adept at generating multilayer grating models, interpreting spectroscopic signals, and predicting bandgaps of test layers, thereby enhancing the accuracy of measurements in semiconductor applications.
Career Highlights
Qiang Zhao's career includes significant tenures at reputable companies such as Kla-Tencor Corporation and Tokyo Electron Limited. His work at these organizations has solidified his reputation as a leading figure in the field of plasma processing technologies and metrology.
Collaborations
Throughout his career, Zhao has had the opportunity to collaborate with esteemed colleagues, including Leonid Poslavsky and Ming Di. These partnerships have undoubtedly contributed to the advancement of their collective research and innovations within the industry.
Conclusion
In summary, Qiang Zhao's contributions to the fields of plasma processing and spectroscopic metrology are invaluable. His 25 patents reflect a commitment to innovation and excellence in technology development. As industries continue to evolve, the impact of Zhao's work will undoubtedly resonate within the semiconductor manufacturing sector and beyond.