Location History:
- Kwacheon, KR (2000)
- Suwon, KR (2002 - 2005)
- Hwaseong-si, KR (2008)
- Gyeonggi-do, KR (2010 - 2015)
- Seoul, KR (1996 - 2016)
Company Filing History:
Years Active: 1996-2016
Title: **Innovations of Tai-Su Park in Semiconductor Technology**
Introduction
Tai-Su Park is a notable inventor based in Seoul, South Korea, with an impressive portfolio of 26 patents to his name. His work primarily focuses on innovations in semiconductor technology, specifically methods for fabricating gate insulating layers and advanced semiconductor devices.
Latest Patents
Among Tai-Su Park's latest patents is the novel method of fabricating gate insulating layers in gate trenches, which enhances the performance of semiconductor devices. This method involves several steps, including forming a field region that defines an active region in a substrate, creating a gate trench that partially exposes both the active and field regions, and applying a gate insulating layer to the active region's surface.
Additionally, he introduced a fabrication process that includes the conformal formation of a gate barrier layer comprising metal on the gate insulating layer and the partially exposed field region, followed by a gate electrode layer. The manufacturing process also involves the formation of a gate capping layer, which may contact various layers to optimize performance.
Another significant patent details the design of recessed channel array transistors and semiconductor devices incorporating these transistors. This innovative design includes a substrate with active and isolation regions and features a recess formed within the active area. The gate oxide layer is crafted carefully to enhance device efficiency by reducing leakage current while increasing on-current.
Career Highlights
Throughout his career, Tai-Su Park has made substantial contributions to the field of semiconductor engineering while working with industry leaders like Samsung Electronics Co., Ltd. His experience in these reputable companies has bolstered his expertise and allowed him to pioneer advancements in semiconductor fabrication.
Collaborations
Park has collaborated with esteemed coworkers such as Si-Young Choi and Yu-Gyun Shin, enhancing his contributions to the industry and furthering advancements in semiconductor technology. Their combined efforts have led to significant breakthroughs that continue to impact technological development.
Conclusion
Tai-Su Park stands out as a leading inventor in the semiconductor field, with a robust record of patents that illustrate his commitment to innovation. His recent advancements in semiconductor device fabrication methods reflect not only his expertise but also his dedication to improving technology for future generations.