Rao Annapragada

Title: Innovations and Contributions of Inventor Rao Annapragada

Introduction

Rao Annapragada is a prominent inventor based in Union City, CA (US). He holds a total of 13 patents that showcase his expertise in the field of semiconductor technology and etching processes. His innovative approaches have significantly contributed to advancements in the industry.

Latest Patents

One of his latest patents is titled "Method to minimize MTJ sidewall damage and bottom electrode redeposition using IBE trimming." This patent describes an improved method for etching a magnetic tunneling junction (MTJ) structure. The method involves a stack of MTJ layers provided on a bottom electrode, which is patterned to form an MTJ device. The process effectively minimizes sidewall damage or redeposition during etching. Another notable patent is focused on "Methods for forming microlenses." This patent outlines techniques for creating microlenses on a semiconductor substrate using an inductively coupled plasma etch process. The process gas mixture allows for precise modifications to the lens shape, ensuring that microlens specifications are met.

Career Highlights

Rao Annapragada has worked with notable companies in the semiconductor industry, including Lam Research Corporation and Mattson Technology, Inc. His experience in these organizations has allowed him to develop and refine his innovative techniques, contributing to the advancement of semiconductor manufacturing processes.

Collaborations

Throughout his career, Rao has collaborated with esteemed colleagues such as Helen H Zhu and Kenji Takeshita. These collaborations have fostered a creative environment that has led to significant technological advancements.

Conclusion

Rao Annapragada's contributions to the field of semiconductor technology through his patents and collaborations highlight his role as an influential inventor. His innovative methods continue to shape the industry and pave the way for future advancements.