The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 19, 2009
Filed:
Jun. 25, 2004
Rao V. Annapragada, Union City, CA (US);
Odette Turmel, Fremont, CA (US);
Kenji Takeshita, Fremont, CA (US);
Lily Zheng, Fremont, CA (US);
Thomas S. Choi, San Jose, CA (US);
David R. Pirkle, Soquel, CA (US);
Rao V. Annapragada, Union City, CA (US);
Odette Turmel, Fremont, CA (US);
Kenji Takeshita, Fremont, CA (US);
Lily Zheng, Fremont, CA (US);
Thomas S. Choi, San Jose, CA (US);
David R. Pirkle, Soquel, CA (US);
Lam Research Corporation, Fremont, CA (US);
Abstract
A method for removing organic material over a substrate is provided. The substrate is placed in a plasma processing chamber. A first gas is provided to an inner zone within the plasma processing chamber. A second gas is provided to an outer zone of the plasma processing chamber, wherein the outer zone surrounds the inner zone and the second gas has a carbon containing component, wherein a concentration of the carbon containing component of the second gas is greater than a concentration of the carbon containing component in the first gas. Plasmas are simultaneously generated from the first gas and second gas. Some or all of the organic material is removed using the generated plasmas.