Company Filing History:
Years Active: 1993-2010
Title: David R Pirkle: Innovator in Plasma Processing Technologies
Introduction
David R Pirkle is a notable inventor based in Soquel, CA (US). He has made significant contributions to the field of plasma processing, holding a total of 13 patents. His work focuses on developing methods and apparatuses that enhance the efficiency and reliability of plasma processing chambers.
Latest Patents
Among his latest patents, Pirkle has developed "Methods and apparatus for sensing unconfinement in a plasma processing chamber." This innovation includes universal plasma unconfinement detection systems that are designed to detect the plasma unconfinement condition in a process-independent and recipe-independent manner. Additionally, he has patented a "Method for providing uniform removal of organic material." This method involves placing a substrate in a plasma processing chamber, where a first gas is introduced to an inner zone and a second gas, containing a higher concentration of carbon, is provided to an outer zone. The generated plasmas from both gases work together to effectively remove organic material from the substrate.
Career Highlights
David R Pirkle is currently employed at Lam Research Corporation, a leading company in the semiconductor equipment industry. His work at Lam Research has allowed him to push the boundaries of plasma processing technology, contributing to advancements that benefit various applications in the semiconductor field.
Collaborations
Pirkle has collaborated with several talented individuals in his field, including S M Reza Sadjadi and William Reid Harshbarger. These collaborations have fostered innovation and have been instrumental in the development of his patented technologies.
Conclusion
David R Pirkle's contributions to plasma processing technologies demonstrate his commitment to innovation and excellence in the field. His patents reflect a deep understanding of the complexities involved in plasma processing, making him a valuable asset to Lam Research Corporation and the broader scientific community.
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