The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 10, 1993

Filed:

May. 24, 1991
Applicant:
Inventors:

Ching-Hwa Chen, Milpitas, CA (US);

David Pirkle, Soquel, CA (US);

Takashi Inoue, Tokyo, JP;

Takashi Inoue, Nishinomiya, JP;

Shunji Miyahara, Itami, JP;

Masahiko Tanaka, Amagasaki, JP;

Assignee:

Lam Research Corporation, Fremont, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C / ; H01L / ;
U.S. Cl.
CPC ...
156345 ; 118723 ; 333252 ;
Abstract

A microwave transmitting window for a plasma processing device. The window is a body of one or more pieces of the same or different dielectric materials. A surface of the window facing a microwave transmitting horn or waveguide is planar and extends perpendicularly to an axial direction. An opposite surface of the window is recessed such that the body has a non-uniform thickness between the two surfaces. The recessed surface can have various shapes and the overall size of the window can be equal to the size of a plasma formation chamber of the plasma processing device. The outlet of the plasma formation chamber can be formed in an end wall or the outlet can be formed by the inner periphery of the plasma formation chamber.

Published as:
WO9222085A1; US5234526A; EP0586579A1; EP0586579A4; JPH08106994A; EP0586579B1; DE69231405D1; DE69231405T2;

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