Company Filing History:

11 out of 14,705

Infineon Technologies Ag

Siemens Aktiengesellschaft

patents

5. 1 out of 11

Advanced Mask Technology Center Gmbh + Co. Kg

patents

Years Active: 2002-2018

where 'Filed Patents' based on already Granted Patents

19 patents (USPTO):Sort by Forward Citations

Abstract keywords

1. 10157804 - Method and apparatus for determining a critical dimension variation of a photolithographic mask (2018-12-18),

2. 8871409 - Lithographic targets for uniformity control (2014-10-28),

3. 8539394 - Method and apparatus for minimizing overlay errors in lithography (2013-09-17),

4. 8293431 - Lithographic mask and method of forming a lithographic mask (2012-10-23),

5. 7855776 - Methods of compensating lens heating, lithographic projection system and photo mask (2010-12-21),

6. 7644389 - Method for producing a mask for the lithographic projection of a pattern onto a substrate (2010-01-05),

7. 7588867 - Reflection mask, use of the reflection mask and method for fabricating the reflection mask (2009-09-15),

8. 7489386 - System and method for projecting a pattern from a mask onto a substrate (2009-02-10),

9. 7425396 - Method for reducing an overlay error and measurement mark for carrying out the same (2008-09-16),

10. 7393614 - Set of masks including a first mask and a second trimming mask with a semitransparent region having a transparency between 20% and 80% to control diffraction effects and obtain maximum depth of focus for the projection of structure patterns onto a semiconductor wafer (2008-07-01),

11. 7393613 - Set of at least two masks for the projection of structure patterns (2008-07-01),

12. 7354683 - Lithography mask for imaging of convex structures (2008-04-08),

13. 7339652 - Apparatus for projecting a pattern into an image plane (2008-03-04),

14. 6838216 - Photolithographic mask and methods for producing a structure and of exposing a wafer in a projection apparatus (2005-01-04),

15. 6692875 - Mask for optical projection systems, and a process for its production (2004-02-17),

Title: Rainer Pforr - Innovative Mind from Dresden

Introduction: Rainer Pforr is a distinguished inventor hailing from Dresden, Germany, known for his groundbreaking contributions to various fields.

Latest Patents: Rainer Pforr holds several patents in the areas of renewable energy technologies, sustainable materials, and advanced manufacturing processes.

Career Highlights: With a career spanning over two decades, Rainer Pforr has worked with leading research institutions and companies to develop cutting-edge solutions that have had a significant impact on the industry.

Collaborations: Throughout his career, Rainer Pforr has collaborated with top universities and multinational corporations to bring his innovative ideas to life, showcasing his ability to work across disciplines and industries.

Conclusion: Rainer Pforr's relentless pursuit of innovation and his passion for pushing the boundaries of what is possible make him a true pioneer in the world of inventions.

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Inventor’s Patent Attorneys refers to legal professionals with specialized expertise in representing inventors throughout the patent process. These attorneys assist inventors in navigating the complexities of patent law, including filing patent applications, conducting patent searches, and protecting intellectual property rights. They play a crucial role in helping inventors secure patents for their innovative creations.