The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 23, 2012
Filed:
Apr. 16, 2010
Haiko Rolff, Dresden, DE;
Carla Byloos, Dresden, DE;
Christoph Noelscher, Nuremberg, DE;
Nicolo Morgana, Dresden, DE;
Roderick Koehle, Ottobrunn, DE;
Molela Moukara, Munich, DE;
Ralf Neubauer, Bammental, DE;
Rainer Pforr, Dresden, DE;
Dominique Savignac, Ismaning, DE;
Haiko Rolff, Dresden, DE;
Carla Byloos, Dresden, DE;
Christoph Noelscher, Nuremberg, DE;
Nicolo Morgana, Dresden, DE;
Roderick Koehle, Ottobrunn, DE;
Molela Moukara, Munich, DE;
Ralf Neubauer, Bammental, DE;
Rainer Pforr, Dresden, DE;
Dominique Savignac, Ismaning, DE;
Abstract
A lithographic mask comprises a first layer including grooves, a second layer including regions, sections and a groove-like structure that encloses the sections. The first and second layers are formed so as to reduce electrical potential differences within the second layer. A method of forming a lithographic mask includes forming first and second layers to dispose the second layer over the first layer, patterning the second layer to comprise sections, a region, and a groove-like structure enclosing the sections, and forming grooves in the first layer at portions not covered by the second layer. The first and second layers are formed to reduce potential differences within the second layers during the step of forming the grooves in the first layer.