Ralf Neubauer

Title: Ralf Neubauer: Innovator in Lithographic Mask Technology

Introduction

Ralf Neubauer is a notable inventor based in Bammental, Germany. He has made significant contributions to the field of lithography, particularly through his innovative patent related to lithographic masks. His work is essential in advancing technologies that rely on precise patterning techniques.

Latest Patents

Ralf Neubauer holds a patent for a lithographic mask and method of forming a lithographic mask. This invention includes a first layer with grooves and a second layer that features regions, sections, and a groove-like structure enclosing the sections. The design of these layers is intended to minimize electrical potential differences within the second layer. The method of forming this lithographic mask involves layering, patterning, and groove formation, all aimed at enhancing the efficiency and effectiveness of lithographic processes.

Career Highlights

Ralf Neubauer is associated with Advanced Mask Technology Center GmbH & Co. KG, where he applies his expertise in lithographic technologies. His work has been instrumental in developing advanced solutions that meet the demands of modern manufacturing processes.

Collaborations

Ralf has collaborated with notable colleagues such as Haiko Rolff and Carla Byloos, contributing to a dynamic work environment that fosters innovation and creativity.

Conclusion

Ralf Neubauer's contributions to lithographic mask technology exemplify the impact of innovative thinking in engineering. His patent and work at Advanced Mask Technology Center GmbH & Co. KG highlight the importance of precision in modern manufacturing.