Advanced Mask Technology Center Gmbh + Co. Kg

Ralf Neubauer

Dominique Savignac

Rainer Pforr

Molela Moukara

Christoph Noelscher

Roderick Koehle

Nicolo Morgana

Carla Byloos

Haiko Rolff

A lithographic mask comprises a first layer including grooves, a second layer including regions, sections and a groove-like structure that encloses the sections. The first and second layers are formed so as to reduce electrical potential differences within the second layer. A method of forming a lithographic mask includes forming first and second layers to dispose the second layer over the first layer, patterning the second layer to comprise sections, a region, and a groove-like structure enclosing the sections, and forming grooves in the first layer at portions not covered by the second layer. The first and second layers are formed to reduce potential differences within the second layers during the step of forming the grooves in the first layer.

Lithographic mask and method of forming a lithographic mask

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Bammental, Germany

Ralf Neubauer