IDiyas

For the Inventor, By the Inventor

Munich, Germany

Molela Moukara

USPTO Granted Patents = 11

Average Co-Inventor Count = 2.7

ph-index = 6

Forward Citations = 63(Granted Patents)


Location History:

  • München, DE (2003 - 2008)
  • Munich, DE (2006 - 2012)

Company Filing History:

goldMedal10 out of 14,705 
 
Infineon Technologies Ag
 patents
silverMedal1 out of 11 
 
Advanced Mask Technology Center Gmbh + Co. Kg
 patents

Years Active: 2003-2012

where 'Filed Patents' based on already Granted Patents

11 patents (USPTO):
1. 8293431 - Lithographic mask and method of forming a lithographic mask (2012-10-23),
2. 7354683 - Lithography mask for imaging of convex structures (2008-04-08),
3. 7339652 - Apparatus for projecting a pattern into an image plane (2008-03-04),
4. 7183022 - Method for producing a mask set for lithography including at least one mask and methods for imaging structures of a predetermined layout into a common exposure plane (2007-02-27),
5. 7143390 - Method for creating alternating phase masks (2006-11-28),
6. 6981241 - Method for eliminating phase conflict centers in alternating phase masks, and method for producing alternating phase masks (2005-12-27),
7. 6957414 - Method for determining the ability to project images of integrated semiconductor circuits onto alternating phase masks (2005-10-18),
8. 6730463 - Method for determining and removing phase conflicts on alternating phase masks (2004-05-04),
9. 6680151 - Alternating phase mask (2004-01-20),
10. 6660437 - Alternating phase mask (2003-12-09),
11. 6543045 - Method for detecting and automatically eliminating phase conflicts on alternating phase masks (2003-04-01),

Title: Molela Moukara: Innovator in Lithographic Mask Technology

Introduction

Molela Moukara is a distinguished inventor based in Munich, Germany. He has made significant contributions to the field of lithography, holding a total of 11 patents. His innovative work focuses on the development of advanced lithographic masks, which are essential in various manufacturing processes.

Latest Patents

Moukara's latest patents include a lithographic mask and a method of forming a lithographic mask. This invention features a first layer with grooves and a second layer that includes regions, sections, and a groove-like structure that encloses the sections. The design aims to reduce electrical potential differences within the second layer. Another notable patent is a lithography mask for imaging convex structures, which incorporates an angled structure element formed by two opaque segments. This design includes a transparent structure adjacent to the angled element, enhancing the imaging capabilities of the mask.

Career Highlights

Throughout his career, Molela Moukara has worked with prominent companies in the technology sector. He has been associated with Infineon Technologies AG and Advanced Mask Technology Center GmbH & Co. KG. His work in these organizations has allowed him to refine his expertise in lithographic technologies and contribute to cutting-edge innovations.

Collaborations

Moukara has collaborated with notable professionals in his field, including Burkhard Ludwig and Rainer Pforr. These partnerships have facilitated the exchange of ideas and advancements in lithographic mask technology.

Conclusion

Molela Moukara's contributions to lithographic mask technology have established him as a key figure in the field. His innovative patents and collaborations reflect his commitment to advancing technology and improving manufacturing processes.

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