The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 27, 2005
Filed:
Jun. 05, 2003
Applicants:
Burkhard Ludwig, München, DE;
Molela Moukara, München, DE;
Inventors:
Burkhard Ludwig, München, DE;
Molela Moukara, München, DE;
Assignee:
Infineon Technologies AG, Munich, DE;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F017/50 ;
U.S. Cl.
CPC ...
Abstract
In order to eliminate phase conflicts in alternating phase masks, the layout is modified after the phase conflicts have been localized. During the modification, degenerate critical structures, which fall below a minimum width and require phase-shifting regions for their adequate imaging, are widened, so that the phase-shifting regions directly adjoining the degenerate critical structures disappear. Moreover, interaction regions between phase-shifting regions can be eliminated by trimming masks, intermediate phases or shifting associated critical structures.