This inventor holds 10 USPTO granted patents and 1 EPO patent. Top assignee: Infineon Technologies Ag. Active years: 2002-2008.
Company Filing History:
Years Active: 2002-2008
Title: Burkhard Ludwig: Innovator in Lithography Technology
Introduction
Burkhard Ludwig is a prominent inventor based in Munich, Germany. He has made significant contributions to the field of lithography, holding a total of 10 patents. His work focuses on innovative solutions that enhance imaging technologies.
Latest Patents
Among his latest patents is a lithography mask designed for imaging convex structures. This invention features an angled structure element formed by two opaque segments, which includes at least one reflex angle. The design incorporates a transparent structure adjacent to the angled element, allowing for improved imaging capabilities. Another notable patent involves a method for eliminating phase conflict centers in alternating phase masks. This method modifies layouts to address localized phase conflicts, ensuring optimal imaging by widening degenerate critical structures.
Career Highlights
Burkhard Ludwig has worked with several notable companies throughout his career, including Infineon Technologies AG and Polaris Innovations Limited. His experience in these organizations has allowed him to develop and refine his innovative ideas in lithography technology.
Collaborations
Throughout his career, Ludwig has collaborated with talented individuals such as Molela Moukara and Michael Heissmeier. These partnerships have contributed to the advancement of his inventions and the overall progress in the field.
Conclusion
Burkhard Ludwig's contributions to lithography technology through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence advancements in imaging technologies.