The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 08, 2008
Filed:
Aug. 27, 2004
Molela Moukara, München, DE;
Burkhard Ludwig, München, DE;
Jörg Thiele, München, DE;
Marco Ahrens, Hohenlinden, DE;
Roderick Köhle, Ottobrunn, DE;
Rainer Pforr, Dresden, DE;
Nicolo Morgana, Dresden, DE;
Molela Moukara, München, DE;
Burkhard Ludwig, München, DE;
Jörg Thiele, München, DE;
Marco Ahrens, Hohenlinden, DE;
Roderick Köhle, Ottobrunn, DE;
Rainer Pforr, Dresden, DE;
Nicolo Morgana, Dresden, DE;
Infineon Technologies AG, Munich, DE;
Abstract
A lithography mask has an angled structure element (O) formed by a first opaque segment (O) and by a second opaque segment (O). The structure element has at least one reflex angle (α). The angled structure element (O) includes at least one convex section (A) facing the reflex angle (α). At least one transparent structure (T) adjacent to the angled structure element (O) is provided at the convex section (A) of the angled structure element (O). The transparent structure (T) is formed in separated fashion at the convex section (A) of the angled structure element (O) and thus comprises two distinguishable transparent segments (T, T) formed at least in sections essentially axially symmetrically with respect to the angle bisector (WH) of the reflex angle.