Company Filing History:
2 out of 14,751 
1 out of 11 Years Active: 2008-2023
Title: Nicolo Morgana: Innovator in Implant Technology
Introduction
Nicolo Morgana is a distinguished inventor based in Dresden, Germany. He has made significant contributions to the field of implant technology, holding a total of 3 patents. His innovative approaches have paved the way for advancements in substrate implantation methods.
Latest Patents
Morgana's latest patents include a method of implanting an implant species into a substrate at different depths. This method involves forming an implant mask over the substrate, which consists of a first implant zone designed as an opening and a second implant zone designed as a block array. The implant species is implanted through the mask at an angle, resulting in two distinct implant areas at varying depths. The first depth is greater than the second depth, showcasing Morgana's ingenuity in optimizing implantation techniques.
Another notable patent is related to a lithographic mask. This mask comprises a first layer with grooves and a second layer that includes regions, sections, and a groove-like structure. The design aims to reduce electrical potential differences within the second layer, enhancing the efficiency of the lithographic process. The method of forming this mask involves careful layering and patterning to achieve the desired structural integrity.
Career Highlights
Throughout his career, Morgana has worked with prominent companies such as Infineon Technologies AG and Advanced Mask Technology Center GmbH & Co. KG. His experience in these organizations has allowed him to refine his skills and contribute to cutting-edge research and development in the field of implant technology.
Collaborations
Morgana has collaborated with notable professionals in his field, including Molela Moukara and Rainer Pforr. These partnerships have further enriched his work and expanded the impact of his innovations.
Conclusion
Nicolo Morgana's contributions to implant technology through his patents and collaborations highlight his role as a leading inventor in the field. His innovative methods and designs continue to influence advancements in substrate implantation techniques.