Roderick Köhle

Title: Roderick Köhle: Semiconductor Lithography Inventor

Introduction

Roderick Köhle is an inventor based in Ottobrunn, Germany, whose patent work focuses on lithography techniques for semiconductor manufacturing. His inventions address mask design and the control of diffraction and imaging effects during the projection of patterns onto semiconductor wafers. He is associated with Infineon Technologies AG and has 3 patents.

Latest Patents

One of Köhle’s latest patents describes a set of coordinated masks for projecting structure patterns into the same photosensitive layer on a semiconductor wafer. A primary mask contains an opaque structure element, while a second mask, such as a trimming mask, has a corresponding semitransparent region. The region’s transparency can be selected between 20% and 80% to help trim unwanted resist areas, control diffraction effects, and enlarge the exposure process window. The design aims to support a greater depth of focus when projecting patterns.

Another patent concerns a lithography mask for imaging convex structures. It describes an angled opaque structure with a reflex angle and a convex section facing that angle. Two distinguishable transparent segments are positioned near the convex section, arranged at least partly symmetrically around the angle bisector. This mask configuration is designed to improve the imaging of convex features.

Career Highlights

Köhle’s patent portfolio reflects work on specialized photolithography methods used in semiconductor fabrication. His disclosed inventions focus on mask structures and optical behavior that can affect pattern transfer, exposure latitude, and imaging quality. His work is associated with Infineon Technologies AG, a semiconductor company.

Collaborations

Rainer Pforr and Jörg Thiele are identified as Köhle’s coworkers. Their names provide context for his professional environment, although the supplied information does not specify their roles in the cited inventions.

Conclusion

Roderick Köhle’s patent work centers on lithography mask designs that address pattern imaging and process control in semiconductor manufacturing. His inventions illustrate how carefully engineered mask structures can help manage exposure conditions and improve the projection of features onto wafers.