The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 27, 2007
Filed:
May. 15, 2003
Applicants:
Molela Moukara, München, DE;
Reinhard Pufall, München, DE;
Inventors:
Molela Moukara, München, DE;
Reinhard Pufall, München, DE;
Assignee:
Infineon Technolgies AG, Munich, DE;
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/00 (2006.01); G03C 5/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method for producing a mask set for lithography including at least one mask, has a predetermined layout of structures which are provided for imaging into a common exposure plane and which are transferred to the masks as a basis. Strongly coupled structures that are so closely adjacent one another, at least in sections, that they are strongly coupled in the case of simultaneous imaging are distributed between at least two different masks of the mask set.