The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 04, 2008

Filed:

Jan. 26, 2006
Applicants:

Molela Moukara, München, DE;

Rainer Pforr, Weixdorf, DE;

Thomas Muelders, Dresden, DE;

Mario Hennig, Dresden, DE;

Karsten Zeiler, München, DE;

Inventors:

Molela Moukara, München, DE;

Rainer Pforr, Weixdorf, DE;

Thomas Muelders, Dresden, DE;

Mario Hennig, Dresden, DE;

Karsten Zeiler, München, DE;

Assignee:

Infineon Technologies AG, Neubiberg, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/54 (2006.01); G03B 27/72 (2006.01); G03B 27/42 (2006.01);
U.S. Cl.
CPC ...
Abstract

An improvement of the imaging quality with simultaneous transfer of line-space gratings and peripheral structures including a MUX space is achieved using a quadrupole illumination whose poles are formed in elongate fashion and whose longitudinal axes are arranged perpendicular to the orientation of the lines of the line-space grating arranged on a mask. The structure imaging of the line-space grating is improved with regard to contrast, MEEF, and process window, while the geometrical fidelity of the peripheral structure, in particular of the MUX space, is stabilized over a wide depth of field range.


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