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Dresden, Germany

Mario Hennig

This inventor holds 7 USPTO granted patents. Top assignees: Infineon Technologies Ag, Qimonda Ag. Active years: 2005-2010.

USPTO Granted Patents = 7

% Patents Active = 14.3

Average Co-Inventor Count = 4.6

ph-index = 3

Forward Citations = 27(Granted Patents)

Company Filing History:

6 out of 15,013

Infineon Technologies Ag

Years Active: 2005-2010

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7 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 7644389 - Method for producing a mask for the lithographic projection of a pattern onto a substrate (2010-01-05),

2. 7425396 - Method for reducing an overlay error and measurement mark for carrying out the same (2008-09-16),

3. 7393614 - Set of masks including a first mask and a second trimming mask with a semitransparent region having a transparency between 20% and 80% to control diffraction effects and obtain maximum depth of focus for the projection of structure patterns onto a semiconductor wafer (2008-07-01),

4. 7393613 - Set of at least two masks for the projection of structure patterns (2008-07-01),

5. 7339652 - Apparatus for projecting a pattern into an image plane (2008-03-04),

6. 7045254 - Mask with programmed defects and method for the fabrication thereof (2006-05-16),

7. 6838216 - Photolithographic mask and methods for producing a structure and of exposing a wafer in a projection apparatus (2005-01-04),

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