Mario Hennig

Title: Mario Hennig and Semiconductor Lithography Innovations.

Introduction

Mario Hennig is an inventor associated with Dresden, Germany. His patent work addresses semiconductor lithography, including mask production, pattern transfer, and the reduction of overlay errors. He is credited with 7 patents and has been associated with Infineon Technologies AG and Qimonda AG.

Latest Patents

One of Hennig’s patents, “Method for Producing a Mask for the Lithographic Projection of a Pattern onto a Substrate,” describes a process for improving the accuracy of lithographic patterning. A layout is divided into partial patterns, and an intermediate mask is created for each one. The masks are progressively used in a stepper or scanner to project a common pattern onto a test mask. Measurements of line-width distribution from the test mask or an exposed test wafer are converted into dose corrections. The transmission of the intermediate masks is then adjusted, using either additional optical elements or shading elements introduced into the masks’ quartz substrates.

Another patent, “Method for Reducing an Overlay Error and Measurement Mark for Carrying Out the Same,” focuses on aligning structures in a layer being patterned with structures in a reference layer. It uses standard measurement marks to determine overlay error and additional marks designed to reveal optical imaging errors in the projection system. Because those imaging errors affect the additional marks and circuit structures similarly, their measurements can help calculate alignment corrections for a subsequent exposure.

Career Highlights

Hennig’s patent portfolio reflects work on precision challenges in semiconductor manufacturing. His inventions address both the control of exposure dose across a mask and the measurement and correction of alignment errors during patterning. His professional associations include Infineon Technologies AG and Qimonda AG.

Collaborations

Among Hennig’s named coworkers are Rainer Pforr and Wolfgang Dettmann. Their shared professional context connects his work to teams involved in semiconductor technology and manufacturing.

Conclusion

Mario Hennig’s patents contribute methods for improving lithographic mask performance and reducing overlay errors, supporting greater precision in semiconductor patterning.