The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 16, 2006
Filed:
Dec. 02, 2002
Applicants:
Wolfgang Dettmann, München, DE;
Gunter Antesberger, München, DE;
Jan Heumann, München, DE;
Mario Hennig, Dresden, DE;
Inventors:
Wolfgang Dettmann, München, DE;
Gunter Antesberger, München, DE;
Jan Heumann, München, DE;
Mario Hennig, Dresden, DE;
Assignee:
Infineon Technologies AG, Munich, DE;
Primary Examiner:
Int. Cl.
CPC ...
G03F 9/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A mask, and in particular a phase shift product mask, utilizes predetermined defects being produced during the fabrication thereof in the so-called 'second layer' process. The defects are identified by markers in their direct vicinity. The markers are quadrangular and indicate, by virtue of their number in combination with their configuration, information about the respectively assigned defect, such as, for example, defect type, defect size, etc.