This inventor holds 1 USPTO granted patent. Top assignee: Infineon Technologies Ag. Active years: 2006.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2006
Title: Jan Heumann and His Patent for Programmed Mask Defects.
Introduction
Jan Heumann is an inventor associated with Munich, Germany, and Infineon Technologies AG. His patent work includes a method for incorporating and identifying programmed defects in masks used in fabrication processes.
Latest Patents
Heumann is credited with 1 patent: “Mask with Programmed Defects and Method for the Fabrication Thereof.” The invention concerns a mask, particularly a phase-shift product mask, in which predetermined defects are introduced during fabrication using a “second layer” process. Nearby quadrangular markers identify each defect. Their number and arrangement encode information such as the defect’s type and size.
Career Highlights
The patent reflects work on mask fabrication and defect identification, where deliberately introduced defects and their markers can provide information useful for evaluating the mask. Heumann is associated with Infineon Technologies AG.
Collaborations
Gunter Antesberger and Mario Hennig are identified as Heumann’s coworkers. Their names are provided as professional associations, though specific roles in the patent are not stated.
Conclusion
Jan Heumann’s patent describes a structured approach to introducing and identifying defects in masks, with markers that convey information about each defect.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile