The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 28, 2006
Filed:
Jun. 30, 2004
Applicant:
Molela Moukara, Munich, DE;
Inventor:
Molela Moukara, Munich, DE;
Assignee:
Infineon Technologies AG, Munich, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01); G06F 19/00 (2006.01); G03F 1/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method is provided for creating a phase mask for lithographic exposure operations. In this case, phase-shifting regions () with a different phase are defined on both sides of critical structures (), which fall below an extent limit. At least one phase shifter correction is carried out such that at least two mutually facing phase-shifting regions () are joined together to form a contiguous phase-shifting region () if their distance from one another falls below a predetermined minimum distance.