Roderick Koehle

Title: Roderick Koehle: Innovator in Lithography Technology

Introduction

Roderick Koehle is a prominent inventor based in Ottobrunn, Germany. He has made significant contributions to the field of lithography, particularly in the manufacturing of semiconductor devices. With a total of six patents to his name, Koehle's work has advanced the technology used in various applications.

Latest Patents

Koehle's latest patents include innovative systems and methods for lithography. One notable patent focuses on multi-beam lithography systems and methods for manufacturing semiconductor devices. This method utilizes the non-coincidence of boundaries of electrical fields emanating from chrome on glass or phase-shifted mask features distributed over two masks. This optimization enhances lithographic process windows, side lobe suppression, and pattern orientation-dependent process window optimization by employing a mask with polarization rotating film on the backside. Another significant patent involves a lithographic mask that comprises a first layer with grooves and a second layer featuring regions, sections, and a groove-like structure that encloses the sections. This design aims to reduce electrical potential differences within the second layer during the lithographic process.

Career Highlights

Throughout his career, Roderick Koehle has worked with notable companies in the semiconductor industry. He has been associated with Infineon Technologies AG and the Advanced Mask Technology Center GmbH & Co. KG. His experience in these organizations has allowed him to develop and refine his innovative approaches to lithography.

Collaborations

Koehle has collaborated with several professionals in his field, including Christoph Noelscher and Martin Verbeek. These collaborations have contributed to the advancement of lithographic technologies and methodologies.

Conclusion

Roderick Koehle's contributions to lithography and semiconductor manufacturing are noteworthy. His innovative patents and career achievements reflect his dedication to advancing technology in this critical field. His work continues to influence the industry and pave the way for future innovations.