The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 06, 2014
Filed:
Oct. 05, 2007
Alois Gutmann, Poughkeepsie, NY (US);
Henning Haffner, Pawling, NY (US);
Sajan Marokkey, Wappinger Falls, NY (US);
Chandrasekhar Sarma, Poughkeepsie, NY (US);
Roderick Koehle, Ottobrunn, DE;
Alois Gutmann, Poughkeepsie, NY (US);
Henning Haffner, Pawling, NY (US);
Sajan Marokkey, Wappinger Falls, NY (US);
Chandrasekhar Sarma, Poughkeepsie, NY (US);
Roderick Koehle, Ottobrunn, DE;
Infineon Technologies AG, Neubiberg, DE;
Abstract
Multi-beam lithography systems and methods of manufacturing semiconductor devices using the same are disclosed. For example, the method utilizes non-coincidence of boundaries of electrical fields emanating from chrome on glass or phase shifted mask features distributed over two masks for the optimization of lithographic process windows, side lobe suppression, or pattern orientation dependent process window optimization employing one mask with polarization rotating film on the backside.