The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 17, 2013
Filed:
Feb. 29, 2012
Rainer Pforr, Dresden, DE;
Rainer Pforr, Dresden, DE;
Carl Zeiss SMS Ltd., Karmiel, IL;
Abstract
A method for minimizing errors of a plurality of photolithographic masks that serve for successively processing a substrate is provided. The method includes determining a reference displacement vector field, in which the reference displacement vector field correlates displacement vectors of the errors of the plurality of photolithographic masks. The method includes determining for each of the photolithographic mask a difference displacement vector field as a difference between the reference displacement vector field and the displacement vectors of the errors of the respective photolithographic mask, and correcting the errors for each of the photolithographic masks using the respective difference displacement vector field.