The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 21, 2010

Filed:

Mar. 26, 2008
Applicants:

Bernd Kuechler, OT Liegau Augustusbad, DE;

Rainer Pforr, Weixdorf, DE;

Thomas Muelders, Erding, DE;

Inventors:

Bernd Kuechler, OT Liegau Augustusbad, DE;

Rainer Pforr, Weixdorf, DE;

Thomas Muelders, Erding, DE;

Assignee:

Qimonda AG, Munich, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/68 (2006.01);
U.S. Cl.
CPC ...
Abstract

Embodiments relate to compensating for lens heating, lithographic projection system and photo mask. Accordingly, lens heating is compensated by providing a layout pattern including a regular pattern being arranged substantially symmetrical in a first region and a sub-resolution pattern including a plurality of sub-resolution structural elements, wherein the sub-resolution pattern in a second region, so as to minimize non-homogenous lens heating of a projection apparatus in case of a lithographic projection.


Find Patent Forward Citations

Loading…