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For the Inventor, By the Inventor

Lujhu, Taiwan

Po-Hsiung Leu

This inventor holds 23 USPTO granted patents and 4 published patent applications, primarily in Semiconductor Fabrication. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2005-2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Po-Hsiung Leu. Retrieved from https://idiyas.com/inventor/po-hsiung-leu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 23 

% Patents Active = 69.6

Average Co-Inventor Count = 5.1

ph-index = 4

Forward Citations = 37(Granted Patents)


Location History:

  • Lujhu Township, Taoyuan County, TW (2005 - 2020)
  • Lujhu Township, TW (2014 - 2020)
  • Taoyuan County, TW (2017 - 2020)
  • Taoyuan, TW (2018 - 2020)

Company Filing History:

goldMedal23 out of 42,872 
 
Taiwan Semiconductor Manufacturing Comp. Ltd.
 patents

Years Active: 2005-2020

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Areas of Expertise:
Coating Apparatus
Plasma Control
Semiconductor Device
Thermal Chemical Vapor Deposition
Shallow Trench Isolation
Dielectric Deposition
High Density Plasma Reactor
Thin Film Deposition
Gap Fill Self Planarization
Interlayer Dielectric
Metal Gate Transistor
Copper Hillock Solution
23 patents (USPTO):Explore Patents
1. 10867838 - Semiconductor device having a shallow trench isolation structure and methods of forming the same (2020-12-15),
2. 10867787 - Method for controlling plasma in semiconductor fabrication (2020-12-15),
3. 10864530 - Coating apparatus and method of forming coating film (2020-12-15),
4. 10724140 - Thermal chemical vapor deposition system and operating method thereof (2020-07-28),
5. 10626499 - Deposition device structure (2020-04-21),
6. 10533252 - Showerhead, semicondcutor processing apparatus having the same and semiconductor process (2020-01-14),
7. 10395918 - Method and system for controlling plasma in semiconductor fabrication (2019-08-27),
8. 10164063 - Semiconductor structure with protection layer (2018-12-25),
9. 10161041 - Thermal chemical vapor deposition system and operating method thereof (2018-12-25),
10. 9953861 - Semiconductor device having a shallow trench isolation structure and methods of forming the same (2018-04-24),
11. 9831307 - Gap fill self planarization on post EPI (2017-11-28),
12. 9716044 - Interlayer dielectric structure with high aspect ratio process (HARP) (2017-07-25),
13. 9631273 - Apparatus for dielectric deposition process (2017-04-25),
14. 9607809 - High density plasma reactor with multiple top coils (2017-03-28),
15. 9573144 - Coating apparatus and method of forming coating film (2017-02-21),

Title: Po-Hsiung Leu: Innovations in Semiconductor Fabrication

Introduction

Po-Hsiung Leu, hailing from Lujhu, Taiwan, is a prolific inventor in the field of semiconductor technology. With an impressive portfolio of 23 patents, he has made significant contributions to innovations that enhance the efficiency and precision of semiconductor fabrication processes.

Latest Patents

Among his latest inventions, Leu has developed a coating apparatus and method for forming a coating film. This innovative apparatus features a spin chuck that securely holds and rotates the substrate, allowing for a precise application of the coating. It incorporates a central coating nozzle, complemented by multiple surrounding nozzles, strategically positioned to ensure an even distribution of coating material.

Additionally, he has designed a method for controlling plasma in semiconductor fabrication. This advanced plasma processing system includes a remote plasma module, compound mixing member, processing chamber, and detection module. This setup allows for accurate monitoring and manipulation of plasma conditions, thereby enhancing the overall semiconductor manufacturing process.

Career Highlights

Leu is currently associated with Taiwan Semiconductor Manufacturing Company Ltd. (TSMC), where he has collaborated with leading professionals in the industry. His technical expertise and innovative mindset have solidified his reputation as a key player in semiconductor advancements.

Collaborations

Throughout his career, Po-Hsiung Leu has worked alongside notable colleagues such as Ding-I Liu and Si-Wen Liao. These collaborations have resulted in a synergistic approach to tackling complex engineering challenges, driving forward the development of cutting-edge technologies in semiconductor manufacturing.

Conclusion

Po-Hsiung Leu's contributions to the field of semiconductor fabrication are commendable. His 23 patents reflect his dedication to improving manufacturing techniques, ensuring that Taiwan remains at the forefront of semiconductor technology. As innovations continue to evolve, Leu's work will undoubtedly influence future advancements in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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