The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 28, 2020
Filed:
Jul. 31, 2018
Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;
Yen-Chan Lo, Hsinchu, TW;
Yi-Fang Lai, Jhubei, TW;
Po-Hsiung Leu, Lujhu Township, TW;
Ding-I Liu, Hsinchu, TW;
Si-Wen Liao, Hsinchu, TW;
Kai-Shiung Hsu, Hsinchu, TW;
Jheng-Uei Hsieh, Zhudong Township, TW;
Shian-Huei Lin, Miaoli County, TW;
Jui-Fu Hsu, Hsinchu, TW;
Cheng-Tsung Wu, Hsinchu, TW;
Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;
Abstract
A thermal chemical vapor deposition (CVD) system includes a bottom chamber, an upper chamber, a workpiece support, a heater and at least one shielding plate. The upper chamber is present over the bottom chamber. The upper chamber and the bottom chamber define a chamber space therebetween. The workpiece support is configured to support a workpiece in the chamber space. The heater is configured to apply heat to the workpiece. The shielding plate is configured to at least partially shield the bottom chamber from the heat.