The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 25, 2017
Filed:
Jul. 25, 2012
Lan-hai Wang, Zhubei, TW;
Ding-i Liu, Hsin-Chu, TW;
Si-wen Liao, Hsin-Chu, TW;
Po-hsiung Leu, Lujhu Township, TW;
Yong-hung Yang, Hsin-Chu, TW;
Lan-Hai Wang, Zhubei, TW;
Ding-I Liu, Hsin-Chu, TW;
Si-Wen Liao, Hsin-Chu, TW;
Po-Hsiung Leu, Lujhu Township, TW;
Yong-Hung Yang, Hsin-Chu, TW;
Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;
Abstract
An apparatus comprises a first gas inlet coupled between a first pipe and a reaction chamber, wherein the first pipe configured to carry process gases, a second gas inlet coupled between a second pipe and the reaction chamber, wherein the second pipe configured to carry a precursor material in a gaseous state and a heating device coupled to the second pipe and the second gas inlet, wherein the heating device keeps an ambient temperature of the second pipe and the second gas inlet above a boiling point of the precursor material.