The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 15, 2020

Filed:

Feb. 17, 2017
Applicant:

Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;

Inventors:

Lan-Hai Wang, Zhubei, TW;

Yong-Hung Yang, Hsinchu, TW;

Ding-I Liu, Hsinchu, TW;

Si-Wen Liao, Hsinchu, TW;

Po-Hsiung Leu, Lujhu Township, Taoyuan County, TW;

Mao-Cheng Lin, Huatan Township, Changhua County, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05B 1/14 (2006.01); B05B 1/18 (2006.01); B05C 11/08 (2006.01); B05B 1/30 (2006.01); H01L 21/67 (2006.01); B05B 15/60 (2018.01); H01L 31/18 (2006.01);
U.S. Cl.
CPC ...
B05B 1/14 (2013.01); B05B 1/185 (2013.01); B05B 1/30 (2013.01); B05B 15/60 (2018.02); B05C 11/08 (2013.01); H01L 21/6715 (2013.01); H01L 21/67051 (2013.01); H01L 31/18 (2013.01);
Abstract

A coating apparatus for forming a coating film over a substrate includes a spin chuck for holding and rotating the substrate, a central coating nozzle over a central portion of the substrate, a plurality of first coating nozzles surrounding the central coating nozzle and spaced apart from the central coating nozzle by substantially a same first distance, and a plurality of second coating nozzles surrounding the central coating nozzle and spaced apart from the central coating nozzle by substantially a same second distance, wherein the second distance is greater than the first distance.


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