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For the Inventor, By the Inventor

Hsinchu, Taiwan

Peng-Chung Jangjian

USPTO Granted Patents = 11 

Average Co-Inventor Count = 5.9

ph-index = 2

Forward Citations = 16(Granted Patents)


Location History:

  • Zhudong Township, TW (2021 - 2023)
  • Hsinchu, TW (2013 - 2024)

Company Filing History:

goldMedal11 out of 40,635 
 
Taiwan Semiconductor Manufacturing Comp. Ltd.
 patents

Years Active: 2013-2025

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11 patents (USPTO):
1. 12359090 - Composition and method for polishing and integrated circuit (2025-07-15),
2. 12297375 - Slurry composition and method for polishing and integrated circuit (2025-05-13),
3. 12172263 - Chemical mechanical planarization tool (2024-12-24),
4. 11942373 - Fin isolation structure for FinFET and method of forming the same (2024-03-26),
5. 11688644 - Fin isolation structure for FinFET and method of forming the same (2023-06-27),
6. 11679469 - Chemical mechanical planarization tool (2023-06-20),
7. 11189727 - FinFET contacts and method forming same (2021-11-30),
8. 10998239 - Fin isolation structure for FinFET and method of forming the same (2021-05-04),
9. 10714395 - Fin isolation structure for FinFET and method of forming the same (2020-07-14),
10. 9333619 - Adaptive endpoint method for pad life effect on chemical mechanical polishing (2016-05-10),
11. 8367429 - Adaptive endpoint method for pad life effect on chemical mechanical polishing (2013-02-05),

Title: Innovations of Peng-Chung Jangjian

Introduction

Peng-Chung Jangjian is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, holding a total of 11 patents. His work primarily focuses on polishing methods and compositions used in integrated circuits.

Latest Patents

Among his latest patents, Peng-Chung Jangjian has developed a composition and method for polishing integrated circuits. This innovation includes a slurry composition that features a cationic surfactant with at least one nitrogen atom in its molecule. The slurry consists of a liquid carrier, abrasives, and a pH adjusting agent, maintaining a pH of less than 7.0. The polishing method utilizes this slurry composition to effectively polish conductive layers in integrated circuits. Another notable patent involves a slurry composition that includes a rheology modifier, enhancing the polishing process for conductive layers.

Career Highlights

Peng-Chung Jangjian is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His expertise in polishing methods has been instrumental in advancing the manufacturing processes of integrated circuits.

Collaborations

He has collaborated with notable coworkers, including Chun-Wen Hsiao and Chu-An Lee, contributing to various innovative projects within the company.

Conclusion

Peng-Chung Jangjian's contributions to the semiconductor industry through his innovative patents and collaborative efforts highlight his significant role in advancing technology. His work continues to impact the field of integrated circuits positively.

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