logo

For the Inventor, By the Inventor

Changhua, Taiwan

Pei-Yi Liu

USPTO Granted Patents = 25

Average Co-Inventor Count = 5.7

ph-index = 8

Forward Citations = 212(Granted Patents)


Location History:

  • Changhua, TW (2013 - 2017)
  • Changhua County, TW (2015 - 2021)
  • Hsinchu, TW (2023)

Company Filing History:

goldMedal25 out of 40,780 
 
Taiwan Semiconductor Manufacturing Comp. Ltd.
 patents

Years Active: 2013-2024

Loading Chart...
25 patents (USPTO):Explore Patents
1. 12166096 - Semiconductor device structure with uneven gate profile (2024-12-10),
2. 11631745 - Semiconductor device structure with uneven gate profile (2023-04-18),
3. 11061317 - Method of fabricating an integrated circuit with non-printable dummy features (2021-07-13),
4. 10811225 - Method of fabricating an integrated circuit with a pattern density-outlier-treatment for optimized pattern density uniformity (2020-10-20),
5. 10431423 - Method of fabricating an integrated circuit with a pattern density-outlier-treatment for optimized pattern density uniformity (2019-10-01),
6. 10359695 - Method of fabricating an integrated circuit with non-printable dummy features (2019-07-23),
7. 10170276 - Method of fabricating an integrated circuit with a pattern density-outlier-treatment for optimized pattern density uniformity (2019-01-01),
8. 9678434 - Grid refinement method (2017-06-13),
9. 9658538 - System and technique for rasterizing circuit layout data (2017-05-23),
10. 9594862 - Method of fabricating an integrated circuit with non-printable dummy features (2017-03-14),
11. 9552964 - Method of fabricating an integrated circuit with a pattern density-outlier-treatment for optimized pattern density uniformity (2017-01-24),
12. 9529271 - Grid refinement method (2016-12-27),
13. 9436788 - Method of fabricating an integrated circuit with block dummy for optimized pattern density uniformity (2016-09-06),
14. 9436787 - Method of fabricating an integrated circuit with optimized pattern density uniformity (2016-09-06),
15. 9329488 - Grid refinement method (2016-05-03),

Title: Innovations of Pei-Yi Liu: A Leader in Semiconductor Technology

Introduction

Pei-Yi Liu, an inventive mind based in Changhua, Taiwan, has made significant contributions to the field of semiconductor technology. With an impressive portfolio of 25 patents, Liu has established himself as a key figure in advancing innovative solutions within this highly competitive industry.

Latest Patents

Among Pei-Yi Liu's latest innovations is a patent for a semiconductor device structure featuring an uneven gate profile. This innovative structure includes a semiconductor substrate with fin active regions protruding above it. A gate stack, which comprises a high-k dielectric material layer and various metal layers, is situated on these fin active regions. The unique aspect of this gate stack is its uneven profile in a sectional view, characterized by three distinct dimensions at different points of the gate, enhancing performance efficiency in semiconductor devices.

Career Highlights

Pei-Yi Liu's career has been marked by his role at Taiwan Semiconductor Manufacturing Company Limited (TSMC), where his expertise in semiconductor technologies has propelled advancements in the field. His innovative approaches and understanding of semiconductor structures have led to a significant number of patents, showcasing his commitment to pushing the boundaries of technology.

Collaborations

Throughout his career, Liu has had the opportunity to collaborate with talented colleagues, including Shy-Jay Lin and Burn Jeng Lin. These collaborations have played a crucial role in fostering innovation and developing cutting-edge semiconductor technologies, contributing to the success of their projects and the firm.

Conclusion

Pei-Yi Liu's impressive array of patents and his role at TSMC underline his importance as an innovator in the semiconductor industry. His latest inventions, particularly the semiconductor device structure with an uneven gate profile, reflect his dedication to enhancing technology and providing significant advancements in the field. As he continues to innovate, Liu remains a prominent figure to watch in the world of semiconductor technology.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…