The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 23, 2017
Filed:
Dec. 19, 2014
Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;
Pei-Yi Liu, Changhua, TW;
Cheng-Chi Wu, Hsinchu, TW;
Cheng-Hung Chen, Zhubei, TW;
Jyuh-Fuh Lin, Chunan Township, TW;
Wen-Chuan Wang, Hsinchu, TW;
Shy-Jay Lin, Jhudong Township, TW;
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD., Hsin-Chu, TW;
Abstract
A technique for converting design shapes into pixel values is provided. The technique may be used to control a direct-write or other lithographic process performed on a workpiece. In an exemplary embodiment, the method includes receiving, at a computing system, a design database specifying a feature having more than four vertices. The computing system also receives a pixel grid. A set of rectangles corresponding to the feature is determined, and the computing system determines an area of a pixel of the pixel grid overlapped by the feature based on the set of rectangles. In some such embodiments, a lithographic exposure intensity is determined for the pixel based on the area overlapped by the feature, and the lithographic exposure intensity is provided for patterning of a workpiece.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile