Nobuyuki Kaji

Title: Nobuyuki Kaji: Innovator in Thin Film Transistor Technology

Introduction

Nobuyuki Kaji is a prominent inventor based in Kawasaki, Japan. He has made significant contributions to the field of thin film transistors, holding a total of 17 patents. His work has been instrumental in advancing display technology, particularly in the development of innovative semiconductor materials.

Latest Patents

Kaji's latest patents include a bottom gate type thin film transistor and a method of manufacturing the same. This invention features a substrate with a gate electrode, a first insulating film as a gate insulating film, and an oxide semiconductor layer as a channel layer. The second insulating film serves as a protective layer, while the source and drain electrodes complete the structure. The oxide semiconductor layer includes an oxide containing elements such as Indium (In), Zinc (Zn), and Tin (Sn). Notably, the second insulating film is an amorphous oxide insulator that is in contact with the oxide semiconductor layer and contains a significant amount of desorbed gas observed as oxygen.

Career Highlights

Nobuyuki Kaji is currently employed at Canon Kabushiki Kaisha, a leading company in imaging and printing technology. His work at Canon has allowed him to focus on the development of advanced display apparatuses and semiconductor technologies.

Collaborations

Kaji has collaborated with notable coworkers, including Hisato Yabuta and Ryo Hayashi. Their combined expertise has contributed to the successful development of innovative technologies in the field of thin film transistors.

Conclusion

Nobuyuki Kaji's contributions to the field of thin film transistors have positioned him as a key innovator in the industry. His patents and collaborative efforts continue to influence advancements in display technology.