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For the Inventor, By the Inventor

Taichung, Taiwan

Meng-Wei Chen

USPTO Granted Patents = 16

Average Co-Inventor Count = 5.8

ph-index = 4

Forward Citations = 48(Granted Patents)


Company Filing History:

goldMedal16 out of 40,635 
 
Taiwan Semiconductor Manufacturing Comp. Ltd.
 patents

Years Active: 2012-2024

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16 patents (USPTO):
1. 11940737 - Method of fabricating reticle (2024-03-26),
2. 11003091 - Method of fabricating reticle (2021-05-11),
3. 10867933 - Method for forming semiconductor device structure with overlay grating (2020-12-15),
4. 10734325 - Method for forming semiconductor device structure with overlay grating (2020-08-04),
5. 10534272 - Method of fabricating reticle (2020-01-14),
6. 10461037 - Method for forming semiconductor device structure with overlay grating (2019-10-29),
7. 10146141 - Lithography process and system with enhanced overlay quality (2018-12-04),
8. 10073354 - Exposure method of wafer substrate, manufacturing method of semiconductor device, and exposure tool (2018-09-11),
9. 9773671 - Material composition and process for mitigating assist feature pattern transfer (2017-09-26),
10. 9129974 - Enhanced FinFET process overlay mark (2015-09-08),
11. 8850369 - Metal cut process flow (2014-09-30),
12. 8840796 - Integrated circuit method with triple patterning (2014-09-23),
13. 8822343 - Enhanced FinFET process overlay mark (2014-09-02),
14. 8455982 - Overlay mark enhancement feature (2013-06-04),
15. 8237297 - System and method for providing alignment mark for high-k metal gate process (2012-08-07),

Title: Innovator Spotlight: Meng-Wei Chen - Revolutionizing Semiconductor Manufacturing in Taichung

Introduction: Meng-Wei Chen is a pioneering inventor based in Taichung, Taiwan, known for his significant contributions to the field of semiconductor manufacturing. With an impressive portfolio of 16 patents, Chen has been instrumental in developing cutting-edge methods that have redefined the fabrication processes in the industry.

Latest Patents: Among his latest patents is a groundbreaking "Method of fabricating reticle," which involves intricate processes such as optical proximity correction (OPC) and precise orientation techniques to enhance the manufacturing of reticles used in semiconductor production. Another notable patent is the "Method of exposing wafer substrate," which optimizes the exposure process by aligning the device pattern on the reticle with the mask field of the exposure tool.

Career Highlights: Meng-Wei Chen is currently affiliated with Taiwan Semiconductor Manufacturing Company Limited (TSMC), a leading semiconductor company at the forefront of technological innovation. His role at TSMC involves spearheading research and development efforts to streamline manufacturing processes and improve overall efficiency in semiconductor production.

Collaborations: Chen has collaborated closely with esteemed colleagues such as Kuei-Shun Chen and Hsueh-Yi Chung, who share his passion for innovation and dedication to advancing semiconductor technology. Together, they have worked on various projects that have garnered widespread recognition within the industry.

Conclusion: Meng-Wei Chen's relentless pursuit of innovation and his pioneering spirit have cemented his reputation as a visionary inventor in the field of semiconductor manufacturing. His groundbreaking patents and collaborations with industry experts underscore his commitment to pushing the boundaries of technological advancement, making him a key figure in shaping the future of semiconductor industry in Taichung and beyond.

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