The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 26, 2024
Filed:
May. 07, 2021
Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;
Hsueh-Yi Chung, Hsinchu County, TW;
Yung-Cheng Chen, Hsinchu County, TW;
Fei-Gwo Tsai, Taipei, TW;
Chi-Hung Liao, New Taipei, TW;
Shih-Chi Fu, Hsinchu County, TW;
Wei-Ti Hsu, Hsinchu County, TW;
Jui-Ping Chuang, Hsinchu, TW;
Tzong-Sheng Chang, Hsinchu County, TW;
Kuei-Shun Chen, Hsinchu, TW;
Meng-Wei Chen, Taichung, TW;
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD., Hsinchu, TW;
Abstract
A method includes receiving a device design layout and a scribe line design layout surrounding the device design layout. The device design layout and the scribe line design layout are rotated in different directions. An optical proximity correction (OPC) process is performed on the rotated device design layout and the rotated scribe line design layout. A reticle includes the device design layout and the scribe line design layout is formed after performing the OPC process.