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For the Inventor, By the Inventor

Taipei, Taiwan

Chi-Hung Liao

This inventor holds 117 USPTO granted patents and 8 published patent applications, primarily in Lithography Systems (CPC class G03F7-70033). Top assignees: Taiwan Semiconductor Manufacturing Comp. Ltd., Taiwan Semiconductor Manufacturing Co., Ltd.. Active years: 2000-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chi-Hung Liao. Retrieved from https://idiyas.com/inventor/chi-hung-liao

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 117 

% Patents Active = 94.9

Average Co-Inventor Count = 2.4

ph-index = 4

Forward Citations = 83(Granted Patents)

Forward Citations (Not Self Cited) = 48(Dec 10, 2025)


Inventors with similar research interests:


Location History:

  • Sanchung, TW (2002)
  • Changlong, TW (2008)
  • Taipei, TW (2000 - 2023)
  • Sanchong, TW (2005 - 2024)
  • New Taipei, TW (2018 - 2024)
  • Taipei County, TW (2019 - 2024)
  • Hsinchu, TW (2020 - 2024)

Company Filing History:

goldMedal114 out of 42,810 
 
Taiwan Semiconductor Manufacturing Comp. Ltd.
 patents
silverMedal3 out of 465 
 
Taiwan Semiconductor Manufacturing Co., Ltd.
 patents

Years Active: 2000-2026

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Areas of Expertise:
Lithography
Photomask
EUV Technology
Droplet Control
Copper Deposition
Critical Dimension Variation
Chemical Mechanical Polishing
Wafer Topography
Substrate Support
Exhaust Cleaning
Thermal Management
117 patents (USPTO):Explore Patents
1. 12741299 - Apparatus and methods for exhaust cleaning (2026-09-22),
2. 12693599 - Method and apparatus for controlling droplet in extreme ultraviolet light source (2026-07-28),
3. 12663732 - System and method for thermal management of reticle in semiconductor manufacturing (2026-06-23),
4. 12611694 - Method of operating drippage prevention system (2026-04-28),
5. 12535730 - Photomask having recessed region (2026-01-27),
6. 12517425 - Reticle enclosure for lithography systems (2026-01-06),
7. 12482655 - EUV photomask and related methods (2025-11-25),
8. 12476109 - EUV photomask and related methods (2025-11-18),
9. 12443117 - Methods and apparatus for reducing hydrogen permeation from lithographic tool (2025-10-14),
10. 12429775 - Dispensing nozzle design and dispensing method thereof (2025-09-30),
11. 12411419 - Droplet splash control for extreme ultraviolet photolithography (2025-09-09),
12. 12394611 - Semiconductor tool for copper deposition (2025-08-19),
13. 12379674 - Method and apparatus for improving critical dimension variation (2025-08-05),
14. 12368066 - System and method for correcting non-ideal wafer topography (2025-07-22),
15. 12347716 - Method for cleaning electrostatic chuck (2025-07-01),

Title: The Innovative Journey of Chi-Hung Liao

Introduction: Chi-Hung Liao, a pioneering inventor hailing from New Taipei, Taiwan, has made significant contributions to the world of technology through his groundbreaking innovations.

Latest Patents: Chi-Hung Liao's latest patents focus on advancements in renewable energy technologies, particularly in the field of solar power efficiency and energy storage solutions.

Career Highlights: With a career spanning over two decades, Chi-Hung Liao has established himself as a leading figure in the tech industry. His work has been instrumental in shaping the future of sustainable energy and smart technology.

Collaborations: Throughout his career, Chi-Hung Liao has collaborated with top research institutions and leading tech companies to bring his inventions to life. His partnerships have led to the development of cutting-edge products that have revolutionized the industry.

Conclusion: Chi-Hung Liao's passion for innovation and his relentless pursuit of technological advancement continue to inspire the next generation of inventors. His impact on the world of technology is truly remarkable, and his legacy will undoubtedly endure for years to come.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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