The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 06, 2026
Filed:
Aug. 30, 2021
Applicant:
Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;
Inventors:
Chi-Hung Liao, Sanchong, TW;
PO-Ming Shih, Hsinchu, TW;
Assignee:
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD., Hsinchu, TW;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 1/66 (2012.01); G03F 1/22 (2012.01); G03F 7/00 (2006.01); H01L 21/673 (2006.01);
U.S. Cl.
CPC ...
G03F 1/66 (2013.01); G03F 1/22 (2013.01); G03F 7/70033 (2013.01); H01L 21/67359 (2013.01);
Abstract
A reticle enclosure includes a base including a first surface, a cover including a second surface and disposed on the base, wherein the base and the cover form an internal space therebetween that includes a reticle, and a layer of electrostatic discharge material disposed on the first surface, wherein the electrostatic discharge material reduces electrostatic charges on the reticle.
Quick Actions:
Liao, Chi-Hung. (2026). Reticle enclosure for lithography systems (U.S. Patent No. 12517425). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12517425
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile